If you are involved in semiconductor manufacturing, this one's for you!
This valuable, in-hand microlithography filtration reference from Pall Microelectronics gives you instant access to filter compatibility tables for essential solvents key to semiconductor manufacturing specific to the microlithography process, and more.
The Pall Microlithography Filtration Tech Note includes a high-level process overview and covers technical issues, solvent surface tension vs wettability of filter membrane, and also includes info on gel removal, low operating pressure, and minimizing chemical waste and metal contamination.
As a bonus, you'll also enjoy engineering-focused units conversions formulas/facts that will settle any argument - length, mass, volume, energy, force, pressure, stress, viscosity.
You'll also be armed with engineering essential physical constants such as Avagadro's number, bohr radius, Faraday's constant, Plank's constant, speed of light in a vacuum, and more.
Solvents:
Acetone
Aquatar
BA - N-butyl acetate
Cyclohexanone
Developer 5% TMAH
DMF - N,N-Dimethyl formamide
EA
ECA - Ethyl cellosolve acetate
EEP - Ethyl3-ethoxypropionate
EGMEA
EL - Ethyl lactate
EP Ethyl pyruvate
IPA - Isopropyl alcohol
MAK - 2-heptanone
MEK - Methyl ethyl ketone
MMP - Methyl 3-methoxypropionate
NMP - N-Methylpyrrolidone
PGMEA - Propylene glycol monomethyl ether acetate
Xylene
Download now to arm yourself with this handy engineering-focused Microlithography Filtration Filtration PDA Reference compliments of Pall Microelectronics.
